看了納米壓印機(jī)的用戶又看了
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NIL**產(chǎn)品
小型納米壓印機(jī)
產(chǎn)品簡介:
Process is controlled by a programmable PLC with touch screen user interface.
User can customize process parameters.
Wafer and Mold are held by vacuum chuck
UV curable imprint polymer compatible with traditional photolithography process
工藝參數(shù)
Wafer size 4 in
Imprintable wafer area 2 in
Imprint pressure 0 - 25 PSI (upgradable to 100 PSI imprint pressure)
Mold substrate size 5 x 0.090 in
Typical imprint throughput < 5 minutes/wafer
設(shè)備尺寸及環(huán)境要求
Controller Platform
Dimension 5.8 x 16.5 x 12 in 17 x 16 x 15 in
Weight 18.5 LB 45 LB
Environment 10 - 35 C, 65% 10 - 35 C, 65%
Facility requirements
Filtered Pressure source 70 - 100 PSI
Vacuum source <-14 PSI
Power 110-220V, 2A, 50/60 Hz
Clean-room class 1000 or better
暫無數(shù)據(jù)!